Photolithography Equipment Market is Expected to Grow at A CAGR of 4.3%

Date: 2015-12-08

The photolithography equipment market is expected to grow at a CAGR of 4.3% between 2015 and 2020. A key driving factor for the growth of the photolithography equipment market is advent of the advanced technologies. Besides, several other factors such as government support and increasing semiconductor industry are also propelling the growth of the market.

“Photolithography EUV equipment is expected to grow at the highest CAGR”:
In the photolithography equipment market, the EUV equipment is estimated to grow at a significant pace during the forecast period. Till recent times, photolithography equipment used deep ultraviolet (DUV) light sources, which generate wavelength in the range of 248 nm-193 nm for manufacturing semiconductor devices. Presently, the use of extreme ultra violet (EUV) equipment is increasing due to use of improved wavelength light source. This light equipment offers high manufacturing speed and reduces time to market for semiconductor devices.

“APAC is the fastest-growing region in the photolithography equipment market”
The market in APAC is expected to grow at the highest CAGR between 2015 and 2020. The growth is attributed to increasing industrialization and urbanization in this region. The increasing semiconductor industry in APAC is the main factor responsible for the increasing adoption of photolithography equipment in the region. Further, the presence of local players such as Nikon (Japan) and Canon (Japan) are also contributing towards the growth of the photolithography equipment market. 

The key players operating in this market include ASML Holdings, N.V. (Netherlands), Nikon Corporation (Japan), Canon, Inc. (Japan), JEOL Ltd. (Japan), NuFlare Technology, Inc.(Japan), Ultratech, Inc. (U.S.), Rudolph Technologies, Inc. (U.S.), SUSS Mictotec, A.G. (Germany), Nil Technology (Denmark), EV Group (U.S.) among others.

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