Global UV Nanoimprint Lithography Market Expected To Register A CAGR Of 5.2% Over 2016-2020

Date: 2016-11-04

In photo nanoimprint lithography, a photo (UV) curable liquid resist is applied to the sample substrate and the mold is normally made of transparent material like fused silica or PDMS. After the mold and the substrate are pressed together, the resist is cured in UV light and becomes solid. After mold separation, a similar pattern transfer process can be used to transfer the pattern in resist onto the underneath material. The use of a UV-transparent mold is difficult in a vacuum, because a vacuum chuck to hold the mold would not be possible.

Thanks to the outstanding advantages like low cost, high throughput and high resolution, especially for producing the large-area micro/nano scale patterns and complex 3-D structures and as well as high-aspect-ratio features, Global UV Nanoimprint Lithography market is expected to register a CAGR of 5.2% over 2016-2020.

In terms of geography, the North America is dominating the market, which is also expected to grow at a highest CAGR of 6.1% for the forecast period, the region followed by Europe, estimated to grow 5.3% CAGR over 2016-2020.

As an emerging cost-effective nanopatterning technique, soft UN-NIL involves two basic aspects: fundamental investigation and application research. The fundamental investigation comprises of theoretical basis and key enabling techniques including process, mold (material, fabrication of working stamp and master template), material (resist, functional material, etc.), tool. The application research mainly covers a variety of practical applications suitable for soft UV-NIL, such as LED patterning, optical components, nanophotonics, biological applications, etc. Author proposed an infrastructure of soft UV-NIL.

UV Nanoimprint Lithography market share by region as following:


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Joanna | Executive – International Business and partner Relations
E-mail: | Tel: 510-400-8520


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